Binary half-tone photolithographic optical apodization mask

A method for creating an apodization mask, the method comprising:

• creating a grid for a pattern, the grid having a plurality of elements;
• processing the plurality of elements using threshold randomization, wherein each element is processed to determine whether that element is to be made into either a transmissive region or an opaque region based on a predetermined local optical density and a random value, wherein the predetermined local optical density and the random value are associated with the element, and wherein the random value is generated on a random basis;
• and
• processing the plurality of elements using spatial randomization, wherein each element is processed to determine whether the position of that element is to be shifted, wherein the positional shift is determined on a random basis.

A system for creating an apodization mask, the system comprising:

• a first control logic configured to create a grid for the pattern, the grid having a plurality of elements;
• a second control logic configured to evaluate each of the plurality of elements to determine whether the element is to be made transmissive based on a predetermined local optical density and a random value, wherein the predetermined local optical density and the random value are associated with the element and wherein the random value is generated on a random basis;
• and
• a third control logic configured to evaluate each of the plurality of elements to determine whether the position of the element is to be shifted, wherein the positional shift is determined on a random basis.