Scatterometry method and device for inspecting patterned medium
AssigneeHitachi High-Technologies Corporation
InventorsHideaki Sasazawa, Takenori Hirose, Minoru Yoshida, Keiya Saito, Shigeru Serikawa
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Abstract
An inspection region is specified using the design information to perform region division for measurement through a scatterometry method. The obtained detection data is classified by pattern into a periodic region and a non-periodic region. A spectroscopic characteristic is detected by an optical sensor to extract features. The extracted features are compared with features stored in a feature map database for each region to evaluate a state of a patterned medium.
Claims11
An inspection method of a patterned medium comprising:
- dividing the patterned medium into a plurality of regions based on design information;
- extracting one or feature amounts at one or more wavelengths selected in advance for each of the divided regions through a scatterometry method;
- and
- for each region comparing each of the feature amounts with design data to determine a state of an object wherein each of the feature amounts are inspected in accordance with deviation from average data of the feature amounts for all regions.
An inspection method of a patterned medium for a hard disk which includes a data region and a servo region, comprising:
- specifying an inspection region based on design information;
- extracting one or more feature amounts at one or more wavelengths selected in advance from data measured through a scatterometry method for each of the inspection regions;
- and
- for each region comparing each of the feature amounts with the design information to inspect a state of the patterned medium, wherein each of the feature amounts are inspected in accordance with deviation from average data of the feature amounts for all regions.
A patterned medium inspection device which includes
- a stage on which a patterned medium is inspected,
- an inspection optical system configured to irradiate light to the patterned medium,
- a detection optical system configured to detect reflection light from the irradiated light, and
- a photoelectronic device, further comprising:
- a position detection unit configured to locate a region on the patterned medium using design information;
- and
- a unit configured to extract one or more feature amounts at one or more wavelengths selected in advance from spectroscopic data output from the photoelectronic device, and
- a data storage unit configured to store the one or more feature amounts for each of the regions, and
- for each region comparing each of the feature amounts with the design information to inspect a state of the patterned medium wherein each of the feature amounts are inspected in accordance with deviation from average data of the feature amounts for all regions.
Dependencies are inferred from the claim text.