Non-volatile memory and operating method of memory cell
AssigneeMacronix International Co., Ltd.
InventorsGuan-Wei Wu, I-Chen Yang, Yao-Wen Chang, Tao-Cheng Lu
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AssigneeMacronix International Co., Ltd.
InventorsGuan-Wei Wu, I-Chen Yang, Yao-Wen Chang, Tao-Cheng Lu
Estimating the term…
A non-volatile memory and a manufacturing method thereof and a method for operating a memory cell are provided. The non-volatile memory includes a substrate, first and second doped regions, a charged-trapping structure, first and second gates and an inter-gate insulation layer. The first and second doped regions are disposed in the substrate and extend along a first direction. The first and second doped regions are arranged alternately. The charged-trapping structure is disposed on the substrate. The first and second gates are disposed on the charged-trapping structure. Each first gate is located above one of the first doped regions. The second gates extend along a second direction and are located above the second doped regions. The inter-gate insulation layer is disposed between the first gates and the second gates. Adjacent first and second doped regions and the first gate, the second gate and the charged-trapping structure therebetween define a memory cell.
A non-volatile memory, comprising:
Dependencies are inferred from the claim text.