Nonvolatile memory device and method of manufacturing the same
AssigneeKabushiki Kaisha Toshiba
InventorsKatsuyuki Sekine, Ryota Fujitsuka, Yoshio Ozawa
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AssigneeKabushiki Kaisha Toshiba
InventorsKatsuyuki Sekine, Ryota Fujitsuka, Yoshio Ozawa
Estimating the term…
According to one embodiment, there is provided a method of manufacturing a nonvolatile memory device. In this method, a first voltage may be applied to a variable resistive element having a resistance value which is electrically rewritable in a high resistance and in a low resistance. In this method, a second voltage may be applied to the variable resistive element in a case where the resistance value of the variable resistive element to which the first voltage has been applied is greater than a resistance value of the low resistance and is not greater than a resistance value of the high resistance. Further, in this method, the applying of the second voltage to the variable resistive element may be repeated until the resistance value of the variable resistive element to which the second voltage has been applied falls within a range of the resistance value of the low resistance.
A nonvolatile memory device comprising:
Dependencies are inferred from the claim text.