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US 8,411,252 B2Granted
Lithographic apparatus and device manufacturing method utilizing a substrate handler
AssigneeASML Netherlands B.V.
InventorsHernes Jacobs, Bernardus Antonius Johannes Luttikhuis, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters
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Abstract
A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table.
Claims5
A substrate handler, comprising:
- a support surface configured to carry a substrate;
- and
- a pre-conditioning unit comprising a device, the device being configured to control a temperature of a substrate and comprising a heat-exchanging element configured to transfer heat away from or to the substrate;
- wherein the pre-conditioning unit is configured to pre-condition the substrate before exposure by a projection system;
- and
- wherein the substrate handler is configured to move the substrate relative to a substrate table.
3 more elements
Dependencies are inferred from the claim text.