Exposure apparatus and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorMiwako Ando
Life of this patent
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Abstract
An exposure apparatus includes a measurement system which performs exposure control measurement using a first mark arranged on an original stage and a second mark arranged on a substrate stage, and a control unit which can set, when the measurement system performs the measurement in order to expose a substrate to light under a certain illumination condition, an illumination condition different from the certain illumination condition.
Claims12
An exposure apparatus which includes an illumination optical system, an original stage which holds an original, a projection optical system, and a substrate stage which holds a substrate, and performs an exposure process of the substrate by illuminating the original by the illumination optical system such that an image of a pattern of the original is projected onto the substrate by the projection optical system, the apparatus comprising:
- a measurement system configured to perform a measurement process for the exposure process using a mark arranged on the original stage and a mark arranged on the substrate stage;
- and
- a device configured to set an effective light source distribution on a pupil plane of the illumination optical system,
- wherein the device sets an effective light source distribution used in the measurement process so as to have a shape that is similar to a shape of an effective light source distribution used in the exposure process and so as to have an area that is larger than an area of the effective light source distribution used in the exposure process.
A method of performing an exposure process using an exposure apparatus that comprises:
- an illumination optical system,
- an original stage which holds an original,
- a projection optical system which projects an image of a pattern of the original onto the substrate,
- a substrate stage which holds a substrate, and
- a device configured to set an effective light source distribution on a pupil plane of the illumination optical system,
- the method comprising:
- performing a measurement process for an exposure process using a mark arranged on the original stage and a mark arranged on the substrate;
- performing the exposure process based on a measurement result provided by the measurement process,
- wherein the exposure process is performed by illuminating the original by the illumination optical system such that an image of a pattern of the original is projected onto the substrate by the projection optical system,
- wherein in the measurement process, an effective light source distribution used in the measurement process is set by the device so as to have a shape that is similar to a shape of an effective light source distribution used in the exposure process and so as to have an area that is larger than an area of the effective light source distribution used in the exposure process.
A device manufacturing method comprising steps of:
- exposing a substrate to light using an exposure apparatus;
- and
- developing the substrate,
- wherein the exposure apparatus includes an illumination optical system, an original stage which holds an original, a projection optical system, and a substrate stage which holds the substrate, and performs an exposure process of the substrate by illuminating the original by the illumination optical system such that an image of a pattern of the original is projected onto the substrate by the projection optical system, the exposure apparatus further includes a measurement system configured to perform a measurement process for the exposure process using a mark arranged on the original stage and a mark arranged on the substrate stage, and a device configured to set an effective light source distribution on a pupil plane of the illumination optical system, and
- wherein the device sets an effective light source distribution used in the measurement process so as to have a shape that is similar to a shape of an effective light source distribution used in the exposure process and so as to have an area that is larger than an area of the effective light source distribution used in the exposure process.
Dependencies are inferred from the claim text.