Organic EL device
AssigneeSharp Kabushiki Kaisha
InventorKazuya Adachi
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Abstract
An organic EL device includes a substrate; an organic EL element formed on the substrate; and a sealing film formed on the organic EL element that is a CVD-deposited silicon nitride film containing from 0.85 at % to 0.95 at % H. A method of manufacturing the organic EL device includes the steps of: forming an organic EL element on a substrate; and forming a sealing film on the organic EL element in a process including mixing SiH4, NH3, N2, and H2, during which the H2 is introduced at a flow rate set to from 1 volume percent to 5 volume percent of that of the N2, so that a silicon nitride film containing hydrogen atoms or hydrogen molecules is formed.
Claims10
An organic EL device, comprising:
- a substrate;
- an organic EL element formed on the substrate;
- and
- a sealing film formed on the organic EL element,
- wherein the sealing film is a CVD-deposited silicon nitride film containing from 0.85 at % to 0.95 at % of H.
An organic EL device having barrier properties with respect to water and oxygen, comprising:
- a substrate;
- an organic EL element formed on the substrate;
- and
- a SiNH sealing film formed on the organic EL element as a CVD-deposited SiNH film comprised of silicon, nitrogen, and from 0.85 at % to 0.95at % of hydrogen, and having a film thickness effective to provide said barrier properties with respect to water and oxygen so that dark spot formation is suppressed.
Dependencies are inferred from the claim text.