Pattern defect inspection method and its apparatus
AssigneeHitachi High-Technologies Corporation
InventorsMinoru Yoshida, Shunji Maeda, Hidetoshi Nishiyama, Masahiro Watanabe
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Abstract
The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.
Claims3
A pattern defect inspection apparatus comprising:
- a recipe setting unit for setting an inspection recipe and/or a review recipe;
- an illumination optical system including:
- a laser light source for emitting a laser toward a sample according to the inspection recipe set by the recipe setting unit, and
- a shutter for selectively restricting passage of the laser emitted from the laser light source;
- and
- a detection optical system for imaging a reflected light image with light reflected from the sample to detect an image signal,
- wherein the shutter opens during image capture at the time of inspecting and at a period time during image capture at the time of reviewing, and
- wherein the detection optical system includes a backside illumination type image sensor which detects the image signal by receiving the reflected light from a front side of the sample at a backside of the image sensor while the shutter is opening.
Dependencies are inferred from the claim text.