Liquid metal ion source, secondary ion mass spectrometer, secondary ion mass spectrometric analysis method and use thereof
AssigneeIon-Tof Technologies GmbH
InventorsFelix Kollmer, Peter Hoerster, Andreas Duetting
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Abstract
A mass spectrometric method according to the Gentle SIMS (G-SIMS) method uses a liquid metal ion source which contains, on the one hand, a first metal with an atomic weight ≧190 U and, on the other hand, another metal with an atomic weight ≦90 U. One of the two types of ions are filtered out alternately from the primary ion beam and directed onto the target as a mass-pure primary ion beam.
Claims41
Secondary particle mass spectrometer for analysis of secondary particles, such as secondary ions and reionised neutral secondary particles, with a liquid metal ion source for producing a primary ion beam for irradiation of a sample and production of such secondary particles, said mass spectrometer comprising a liquid metal ion source which contains bismuth alloy and a filter device with which, from the primary ion beam emitted by the liquid metal ion source, both one of a plurality of bismuth ion types, the mass of which is approximately or precisely a multiple of the monoatomic bismuth ion charged once or several times, is filtered out as a mass-pure filtered primary ion beam and also a primary ion beam filtered from a plurality of ion types of the alloy metal as mass-pure filtered primary ion beam.
Secondary particle mass spectrometric analysis method for analysis of a sample to be analyzed, the surface of the sample to be analyzed being irradiated with a primary ion beam, wherein a primary ion beam is produced which contains monoatomic or polyatomic ions of a first metal and monoatomic ions of a further metal, the ions of the first metal having an atomic weight ≧190 u and the ions of the further metal an atomic weight ≦90 u, there being filtered out alternately, on the one hand, one of a plurality of ion types of the first metal from the primary ion beam as mass-pure filtered primary ion beam and, on the other hand, one of a plurality of ion types of the further metal as mass-pure filtered primary ion beam;
- the secondary particle spectrum being determined with the filtered primary ion beam containing the ions of the first metal, respectively, and the secondary particle spectrum being determined with the filtered primary ion beam containing the ions of the further metal.
Dependencies are inferred from the claim text.