Etching composition for etching a transparent electrode

A method of etching a transparent electrode layer comprising:

• forming the transparent electrode layer on a substrate;
• forming a photo resist pattern on the transparent electrode layer;
• and
• etching the transparent electrode layer by using an etchant,
• wherein the etchant comprises an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and water,
• wherein the inorganic acid comprises H2SO4 and another inorganic acid, and a concentration of H2SO4 is less than half of a concentration of the another inorganic acid.