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US 8,409,991 B2Granted
Method for manufacturing large-area vacuum plasma treated substrates and vacuum plasma treatment apparatus
AssigneeOerlikon Solar AG, Trubbach
InventorsStephan Jost, Andreas Belinger
Life of this patent
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Abstract
A large surface substrate (5, 5a) is Rf vacuum plasma treated with the help of an electrode arrangement (9) consisting of an even number of electrode strips (9a, 9b). At least one of the strips is Rf supplied at least two distinct loci (P1, P2) along the central axis (A) of the addressed strip (9a).
Claims12
A method for manufacturing vacuum plasma treated substrates comprising:
- exposing in a vacuum recipient a substrate surface of at least 1 m2 to be treated to a substantially plane and distant electrode pattern comprising of an even number of parallel, mutually distant electrode strips of substantially equal length,
- supplying Rf plasma discharge energy to at least one of said strips at least two distinct loci along the length axis of said at least one strip,
- treating said substrate by a plasma established with said electrode pattern, and
- selecting said loci along said length axis to have an average of mutual distances, the outermost of said at least two loci being distant from the small edges of the strip by s/2+20%, wherein the loci along said length axis are chosen to achieve a homogeneous surface treatment on substrate.
1 more element
A method for manufacturing vacuum plasma treated substrates comprising:
- exposing in a vacuum recipient a substrate surface of at least 1 m2 to be treated to a substantially plane and distant electrode pattern comprising of Ne parallel, mutually distant electrode strips of substantially equal length,
- supplying Rf plasma discharge energy to at least one of said strips at at least two distinct loci along the length axis of said at least one strip,
- treating said substrate by a plasma established with said electrode pattern, wherein the Rf is supplied in an odd number of phases, and wherein Ne is an integer multiple of the number of phases.
Dependencies are inferred from the claim text.