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US 8,409,934 B2Granted
Methods for forming materials using micro-heaters and electronic devices including such materials
AssigneeSamsung Electronics Co., Ltd.
InventorsJunhee Choi, Andrei Zoulkarneev, SungSoo Park
Life of this patent
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Abstract
Nano-sized materials and/or polysilicon are formed using heat generated from a micro-heater, the micro-heater may include a substrate, a heating element unit formed on the substrate, and a support structure formed between the substrate and the heating element unit. Two or more of the heating element units may be connected in series.
Claims20
A method for forming a material comprising:
- applying energy to a micro-heater to heat the micro-heater;
- providing a precursor so as to be in thermal proximity to the micro-heater;
- and
- forming a material from the precursor with the heat from the micro-heater such that the material is formed directly on the micro-heater,
- wherein the micro-heater includes a substrate, at least one heating element unit on the substrate, a support structure between a portion of the substrate and a portion of the at least one heating element unit,
- wherein the at least one heating element unit has a configuration that allows two or more heating element units to be repeatedly connected in series,
- wherein the at least one heating element unit has at least two first regions and a second region, the second region being located between the first regions, and the first regions having a higher light emission and heat generation than the second region, and
- wherein the support structure is located below a portion of the second region but not below the first regions.
5 more elements
The electronic device of 18, further comprising:
- a drain electrode;
- and
- a source electrode;
- wherein the drain electrode and the source electrode intersect on a portion of the substrate at right angles and polysilicon is formed on the drain and source electrodes to form a transistor.
1 more element
Dependencies are inferred from the claim text.