Photosensitive resin composition, dry film, and processed product made using the same
AssigneeMitsui Chemicals, Inc.
InventorsKatsuhiko Funaki, Etsuo Ohkawado, Kousuke Hirota, Syuji Tahara
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AssigneeMitsui Chemicals, Inc.
InventorsKatsuhiko Funaki, Etsuo Ohkawado, Kousuke Hirota, Syuji Tahara
Estimating the term…
Disclosed is a photosensitive resin composition which does not contain any halogenated compound or any antimony compound that has a high risk of putting a load on the environment, which exerts good flame retardancy after being cured, and which particularly meets the recent exacting requirements with respect to bending resistance and insulation reliability. Specifically disclosed is a photosensitive resin composition comprising: (A) a (meth)acrylate compound represented by the general formula (1); (B) a polyimide precursor; and (C) a photopolymerization initiator [in the formula, R1 represents a hydrogen atom or a methyl group; R2 represents a hydrogen atom or a univalent organic group; n and m independently represent an integer of 1 to 5; p represents an integer of 0 to 6; q and r independently represent an integer of 0 to 4; and s represent an integer of 0 to 6, provided that the sum of p, q, r and s is 6, and the sum total of p and s may range from 3 to 6 and is preferably 6].
A photosensitive resin composition comprising:
Dependencies are inferred from the claim text.