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US 8,409,716 B2Granted
Glass or glass-ceramic substrate with scratch-resistant coating and method for the production thereof
AssigneeSchott AG
InventorsNiko Schultz, Christian Henn, Falk Gabel, Andreas Hahn
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Abstract
The invention in general relates to glass or glass-ceramic products. In order to protect the surface of such products against scratching, a silicon oxynitride coating with special composition is provided.
Claims19
A glass article with a scratch-resistant coating, comprising:
- a glass or glass-ceramic substrate,
- a silicon oxynitride layer deposited on the substrate as a scratch-resistant layer, wherein the silicon oxynitride layer has a ratio of atomic percentages of oxygen to nitrogen of more than 1 as measured with secondary-ion mass spectrometry and etching of the layer by means of a cesium ion beam, and
- wherein the silicon oxynitride layer has a layer thickness of at least 500 nanometers, and
- wherein the silicon oxynitride layer comprises several first layer parts and several second layer parts following one another, the first layer parts having a higher oxygen content than the second layer parts.
1 more element
A glass article with a scratch-resistant coating, comprising:
- a glass or glass-ceramic substrate,
- a silicon oxynitride layer deposited on the substrate as a scratch-resistant layer, wherein the silicon oxynitride layer has a ratio of atomic percentages of oxygen to nitrogen of more than 1 as measured with secondary-ion mass spectrometry and etching of the layer by means of a cesium ion beam,
- wherein the silicon oxynitride layer has a layer thickness of at least 500 nanometers, and
- wherein the substrate comprises a volume-colored glass ceramic.
1 more element
A glass article with a scratch-resistant coating, comprising:
- a glass or glass-ceramic substrate,
- a silicon oxynitride layer deposited on the substrate as a scratch-resistant layer, wherein the silicon oxynitride layer has a ratio of atomic percentages of oxygen to nitrogen of more than 1 as measured with secondary-ion mass spectrometry and etching of the layer by means of a cesium ion beam, and
- wherein the silicon oxynitride layer has a layer thickness of at least 500 nanometers,
- wherein the scratch-resistant layer comprises a scratch-resistant coating having multiple layer parts with at least one layer comprising the silicon oxynitride layer, and
- wherein the multiple layer parts of the scratch-resistant coating comprise an alternating layer system of at least one layer comprising the silicon oxynitride layer and at least one layer comprising a silicon nitride layer.
2 more elements
Dependencies are inferred from the claim text.