Hollow cathode device and method for using the device to control the uniformity of a plasma process

A method of adjusting the spatial distribution of plasma in a process chamber, comprising:

• forming plasma in a process chamber using a plasma generation system;
• injecting electrons from one or more hollow cathode plasma sources coupled to said process chamber, wherein at least one of the hollow cathode plasma sources is configured to create a hollow cathode plasma in a hollow cathode region, the hollow cathode region being at least in part enclosed by the hollow cathode plasma source, the hollow cathode plasma source having one or more plasma-facing surfaces in contact with said hollow cathode plasma, wherein at least one of said one or more plasma-facing surfaces is movable in order to vary the size of said hollow cathode region to adjust the properties of said hollow cathode plasma;
• and
• adjusting a property of the hollow cathode plasma formed in at least one of said one or more hollow cathode plasma sources.