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US 8,409,363 B2Granted
Method of fabricating semiconductor cleaners
AssigneeInfineon Technologies AG
InventorFrank Weber
Life of this patent
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Abstract
A method of manufacturing cleaning solvents is provided. The method includes selecting a small plurality of test solvents from a large plurality of perspective solvents. The equilibrium composition of a multi-component solution is preferably described by the Hansen solubility model. A small plurality of test solvents is applied to solute samples and the degree of dissolution or swelling recorded. Based on the degree of dissolution or swelling, at least one solvent is selected from the large plurality of perspective solvents based on the Hansen parameters.
Claims17
A method for fabricating a semiconductor device, the method comprising:
- generating a material on a semiconductor substrate;
- removing the material with a cleaning solution comprising a cleaning solvent, wherein the cleaning solvent is selected according to a selection method, the selection method comprising:
- compiling a database that includes a large plurality of perspective solvents and solubility parameters for the large plurality of perspective solvents;
- selecting from the large plurality of perspective solvents, a small plurality of test solvents;
- performing dissolution tests on the material using the small plurality of test solvents;
- calculating solubility parameters of the cleaning solvent based on the dissolution tests;
- and
- selecting the cleaning solvent from the database using the calculated solubility parameters of the cleaning solvent.
5 more elements
Dependencies are inferred from the claim text.