Process for manufacturing polishing pad

A method for manufacturing a polishing pad, comprising the steps of:

• preparing a cell-dispersed urethane composition by a mechanical foaming method;
• placing a light-transmitting region at a predetermined position on a face material or a belt conveyor, while feeding or moving the face material or the belt conveyor;
• continuously discharging the cell-dispersed urethane composition onto a part of the face material or the belt conveyor where the light-transmitting region is not placed;
• placing another face material or another belt conveyor on the discharged cell-dispersed urethane composition;
• curing the cell-dispersed urethane composition to form a polishing region comprising a polyurethane foam, while its thickness is controlled to be uniform, so that a polishing sheet is prepared;
• applying, after removing the face material or the belt conveyor from the polishing sheet, a polyurethane resin coating composition containing an aliphatic and/or alicyclic polyisocyanate to a side of the polishing sheet from which the face material or the belt conveyor is removed and curing the polyurethane resin coating composition to form a water-impermeable film;
• and
• cutting the polishing sheet.