Coating/developing device and method

A coating/developing device in which a substrates loaded through a carrier into a carrier block is transferred to a processing block where a coating film including a resist film is formed on each of the substrates, and are then transferred through and interface block connected to an opposing side of the carrier block with respect to the processing block to an exposure device and returned through the interface block to the processing block, each of exposed substrates being developed at the processing block and then transferred to the carrier block, wherein:

• a) the processing block includes a plurality of coating unit blocks and a developing unit block stacked on one another, each of the substrates from the carrier block being loaded into one of the coating unit blocks;
• b) each of the coating unit blocks and the developing unit block includes a transferring area, that connects the carrier block to the interface block, extended in a longitudinal direction of said each of the coating unit blocks and the developing unit block, a liquid processing unit that coats a liquid chemical on a substrate, a heating unit that heats the substrate, a cooling unit that cools the substrate and a transfer configured to move back and forth in the longitudinal direction along the transferring area to transfer the substrate among the liquid processing unit, the heating unit and the cooling unit;
• and
• c) the liquid processing unit provided in each of the coating unit blocks includes a coating unit that coats a resist liquid on the substrate and a bottom antireflection coating (BARC) forming unit that coats a liquid chemical for a BARC on the substrate after the resist liquid is coated thereon, wherein the processing that forms the coating film including the resist film on each of the substrates is performed in one of the coating unit blocks.