Achromatically bending a beam of charged particles by about ninety degrees
AssigneeAccuray Incorporated
InventorsBarry A. MacKinnon, Roger H. Miller
Life of this patent
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Abstract
Embodiments of the invention provide systems and methods for achromatically bending beam of charged particles by about 90° during radiation treatment. A system may include first, second, third, and fourth bending magnets serially arranged along the particle beam path. The first and fourth bending magnets are configured to generate a positive field gradient that defocuses the particle beam in the bend plane. The second and third bending magnets are configured to generate a negative field gradient that focuses the particle beam in the bend plane. The first, second, third, and fourth bending magnets collectively bend the particle beam by about 90°, e.g., by about 22.5° each.
Claims20
A system for achromatically bending a particle beam by about 90°, the system comprising:
- first, second, third, and fourth bending magnets serially arranged along a beam path of the particle beam,
- the first and fourth bending magnets being configured to generate a positive field gradient that defocuses the particle beam in a bend plane;
- the second and third bending magnets being configured to generate a negative field gradient that focuses the particle beam in the bend plane;
- the first, second, third, and fourth bending magnets collectively bending the particle beam by about 90°.
A method for achromatically bending a particle beam by about 90°, the system comprising:
- bending the particle beam with a first bending magnet that defocuses the particle beam in a first plane with a positive field gradient, and then
- bending the particle beam with a second bending magnet that focuses the particle beam in the first plane with a negative field gradient, and then
- bending the particle beam with a third bending magnet that focuses the particle beam in the first plane with a negative field gradient, and then
- bending the particle beam with a fourth bending magnet that defocuses the particle beam in the first plane with a positive field gradient,
- wherein the first, second, third, and fourth bending magnets collectively bend the particle beam by about 90°.
A system for achromatically bending a particle beam by about 90°, the system comprising:
- first, second, third, and fourth bending magnets serially arranged along a beam path of the particle beam,
- a midpoint between the second and third bending magnets defining a reflection plane, the first and fourth bending magnets being positioned substantially symmetrically across the reflection plane from one another, and the second and third bending magnets being positioned substantially symmetrically across the reflection plane from one another;
- the first and fourth bending magnets being configured to generate a positive field gradient that defocuses the particle beam in a bend plane;
- and
- the second and third bending magnets being configured to generate a negative field gradient that focuses the particle beam in the bend plane.
Dependencies are inferred from the claim text.