Method of fabricating electron-emitting device and method of manufacturing image display apparatus
AssigneeCanon Kabushiki Kaisha
InventorsNaofumi Aoki, Shoji Nishida
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Abstract
The following method is provided: a method of readily fabricating an electron-emitting device, coated with a low-work function material, having good electron-emitting properties with high reproducibility such that differences in electron-emitting properties between electron-emitting devices are reduced. Before a structure is coated with the low-work function material, a metal oxide layer is formed on the structure.
Claims2
A method of fabricating electron-emitting device including electron-emitting member which includes a structure containing a metal and a low-work function layer, made of a material with a work function less than that of the metal, overlying the structure and which field-emits electrons from a surface, the method comprising:
- providing a structure containing a metal, on which a metal oxide layer containing an oxide of a same metal as the metal contained in the structure has been formed;
- and
- providing a low-work function layer on the metal oxide layer,
- wherein the low-work function layer is made of polycrystalline lanthanum boride, and
- wherein the metal is molybdenum and the metal oxide layer contains an oxide of molybdenum.
Dependencies are inferred from the claim text.