Gas processing apparatus, gas processing system, and gas processing method, and exhaust gas processing system and internal combustion engine using the same

A gas processing apparatus using plasma;

• the gas processing apparatus comprising:
• a plasma equipment series having a plurality of units of plasma equipment arranged in series on a gas flow channel;
• and
• a controller that controls the plurality of controlling the operation of each of the units of plasma equipment of the plasma equipment series;
• wherein each of the plurality of units of plasma equipment has a plasma generator for generating plasma within a reaction chamber communicated with the gas flow channel;
• and an electromagnetic wave radiator for radiating electromagnetic waves to the plasma generated by the plasma generator;
• wherein the controller selects the number of the plurality of units of plasma equipment to operate according to a component of the introduced gas,
• wherein the reaction chamber is communicated with the gas flow channel via a bundled plurality of pipes made of an electrical conductor wherein the bundled plurality of pipes is supported by a support panel, and the bundled plurality of pipes on said support panel form a cavity in the reaction chamber, and
• wherein the inside diameter of each of the bundled plurality of pipes is less than about ¼ th the wavelength of the electromagnetic waves, and the length of each of the bundled plurality of pipes is about ¼ th or more of the wavelength, for preventing the electromagnetic waves from escaping from said cavity.