# US 8,356,575 B2 · Ion source and plasma processing apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,356,575 B2 - Document ID: US8356575B2 - Status: Granted - Kind: B2 - Application number: 11/990,787 - Filed: 2006-09-07 - Published: 2009-10-08 - Granted: 2013-01-22 - Earliest claimed: 2005-09-09 - Assignees: Ulvac, Inc. - Applicants: Naruyasu Sasaki; Saburou Shimizu; Toshiju Kunibe - Inventors: Naruyasu Sasaki; Saburou Shimizu; Toshiju Kunibe - Web page: https://patentgrep.com/patent/US8356575B2 ## CPC - H05H 1/46: using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) - H01J 37/3053: {for evaporating or etching} - H01J 37/32357: {Generation remote from the workpiece, e.g. down-stream} - H01J 37/32422: {Arrangement for selecting ions or species in the plasma} - H01J 2237/0213: Avoiding deleterious effects due to interactions between particles and tube elements - H01J 2237/022: Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube - H01J 2237/08: Ion sources - H01J 2237/16: Vessels - H05H: PLASMA TECHNIQUE (apparatus or processes specially adapted for producing X-rays H05G2/00); PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract It is an object of this invention to provide an ion source and a plasma processing apparatus capable of generating stable and long-life plasma. The ion source is provided with a high-frequency antenna (16) installed on the outer peripheral side of a partition wall (15) made of a dielectric material and partitioning a plasma generating chamber (14) and a shield body (26) made of a dielectric material and preventing deposition on the inner peripheral surface of the partition wall (15) facing the high-frequency antenna (16) inside the plasma generating chamber (14). The structure made of a dielectric material can prevent an increase in high-frequency power required for inductive coupling with plasma. The shield body (26) is formed with a slot (26a) in a direction crossing a winding direction of the high-frequency antenna (16). Since this arrangement can prevent continuous deposition on the inner surface of the partition wall in the winding direction of the high-frequency antenna, an induction loss between the high-frequency antenna and the plasma generating chamber can be effectively prevented even if the deposited film is made of a conductive material. ## Claims ### Claim 1 An ion source, comprising: a plasma generating chamber; a partition wall made of a dielectric material and partitioning the plasma generating chamber, the partition wall having a projection; a high-frequency antenna having a winding and installed at an external portion of said partition wall for generating a plasma in the plasma generating chamber; and a shield body installed inside the plasma generating chamber the shield body made of a dielectric material, covering the inner surface of the partition wall, and having at least one slot formed therein in a direction crossing a winding direction of the high-frequency antenna, wherein the projection is made of a dielectric material and formed on at least one part of the inner surface of the partition wall and extended in a direction crossing a winding direction of the high-frequency antenna, and wherein the shield body has a groove formed on an outer surface thereof to accommodate the projection, the groove formed at a position opposite to the projection in a radial direction of the high-frequency antenna. ### Claim 2 (depends on 1) The ion source according to claim 1 further comprising an extraction electrode for extracting ions from the plasma generated in the plasma generating chamber. ### Claim 3 A plasma processing apparatus, comprising: a process chamber for containing a substrate to be processed; a plasma generating chamber; a partition wall made of a dielectric material and partitioning the plasma generating chamber, the partition wall having a projection; a high-frequency antenna installed at an external portion of the partition wall for generating a plasma in the plasma generating chamber; and a shield body installed inside the plasma generating chamber, the shield body made of a dielectric material, covering the inner surface of the partition wall, and having at least one slot formed therein in a direction crossing a winding direction of the high-frequency antenna, wherein the projection is made of a dielectric material and formed on at least one part of the inner surface of the partition wall and extended in a direction crossing a winding direction of the high-frequency antenna, and wherein the shield body has a groove formed on an outer surface thereof to accommodate the projection, the groove formed at a position opposite to the projection in a radial direction of the high-frequency antenna. ### Claim 4 (depends on 3) The plasma processing apparatus according to claim 3, wherein an extraction electrode for extracting ions from the plasma generated in the plasma generating chamber toward the process chamber is installed between the plasma generating chamber and the process chamber. ### Claim 5 (depends on 3) The plasma processing apparatus according to claim 3, wherein a sputtering target irradiated with ions extracted from the plasma generating chamber and depositing sputtered materials onto the substrate to be processed is installed inside the process chamber.