Charged particle beam apparatus
AssigneeHitachi High-Technologies Corporation
InventorsTadashi Otaka, Hiroyuki Ito, Ryoichi Ishii, Manabu Yano, Hajime Kawano
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AssigneeHitachi High-Technologies Corporation
InventorsTadashi Otaka, Hiroyuki Ito, Ryoichi Ishii, Manabu Yano, Hajime Kawano
Estimating the term…
An exemplary a charged particle beam apparatus converts an inspection position on a test sample (wafer coordinate system) to a setting position of an inspection mechanism (stage coordinate system (polar coordinate system)), a rotating arm and a rotating stage being rotated to be moved for the inspection position on the test sample. In this case, inspection devices are arranged over a locus that is drawn by the center of the rotating stage according to the rotation of the rotating arm. A function for calculating errors (e.g., center shift of the rotating stage) and compensating for the errors is provided, by which the precision of inspection is improved in a charged particle beam apparatus equipped with a biaxial rotating stage mechanism.
A charged particle beam apparatus for conducting inspection or measurement of a target sample using a secondary particle image, the apparatus comprising:
A charged particle beam apparatus for conducting inspection or measurement of a target sample using a secondary particle image, the apparatus comprising:
A method for acquiring a charged particle image using a charged particle beam apparatus having a biaxial rotating stage mechanism including a rotating stage which rotates a target sample placed thereon around a prescribed rotation center;
Dependencies are inferred from the claim text.