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AssigneeAZ Electronic Materials USA Corp.
InventorsHuirong Yao, Guanyang Lin, Jian Yin, Hengpeng Wu, Mark Neisser, Ralph Dammel
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The present invention relates to an antireflective coating composition comprising a novel polymer without an aromatic chromophore, where the polymer comprises a structural unit derived from an aminoplast and a structural unit derived from a diol, triol, dithiol, trithiol, other polyols, diacid, triacid, other polyacids, diimide or mixture thereof, where the diol, dithiol, triol, trithiol, diacid, triacid, diimide, diamide or imide-amide optionally contain one or more nitrogen and/or sulfur atoms or contain one or more alkene groups. The invention also relates to the novel polymer and a process for using the novel antireflective coating composition in a lithographic process.
An antireflective coating composition comprising a polymer which does not contain an aromatic chromophore, and a thermal acid generator, further where the polymer when a film is formed has a absorption parameter (k) value from 0.20 to 0.27 at 193 nm and a refractive index (n) value from 1.88 to 1.94 at 193 nm and where the polymer comprises a structural unit derived from a reaction of an aminoplast and a reactant selected from the group consisting of a diol, triol, other polyols, diacid, triacid, and other polyacids, and further where the structural unit is selected from the following structures,
An antireflective coating composition comprising a polymer which does not contain an aromatic chromophore, and a thermal acid generator, where the polymer comprises a repeating unit derived from a glycoluril-aldehyde aminoplast and a repeating unit derived from a cyanuric acid compound with hydroxyl groups further where the polymer when a film is formed has a absorption parameter (k) value from 0.20 to 0.27 at 193 nm and a refractive index (n) value from 1.88 to 1.94 at 193 nm.
Dependencies are inferred from the claim text.