Susceptor and semiconductor manufacturing apparatus including the same

A semiconductor manufacturing apparatus comprising:

• a reaction chamber;
• a heating unit that generates heat in the reaction chamber;
• a susceptor on which a wafer is loaded and that includes a plurality of pockets each having a bottom surface that is inclined, wherein the plurality of pockets are disposed on a top surface of the susceptor, and wherein the susceptor is disposed over the heating unit;
• a shroud configured to supply source materials to the reaction chamber, wherein the shroud is disposed over the susceptor;
• and
• a rotation shaft coupled with the susceptor, wherein the rotation shaft is disposed under the susceptor,
• wherein the top surface of the susceptor is parallel to a bottom surface of the reaction chamber and substantially perpendicular to a flow of the source materials,
• wherein an inclination angle of the bottom surface of each pocket is in a range of 0°<θ≦10° based on the top surface of the susceptor,
• wherein one of the plurality of pockets has a bottom surface having an inclined surface formed so that an inner point is deeper than an outer point, and another of the plurality of pockets has a bottom surface having an inclined surface formed so that an outer point is deeper than the inner point, and
• wherein the inner point is referenced to the center of the entire susceptor and the outer point is referenced to the outer periphery of the susceptor.