Method and system for mask handling in high productivity chamber
AssigneeIntermolecular, Inc.
InventorsRick Endo, Kurt Weiner, James Tsung
Life of this patent
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Abstract
A structure for independently supporting a wafer and a mask in a processing chamber is provided. The structure includes a set of extensions for supporting the wafer and a set of extensions supporting the mask. The set of extensions for the wafer and the set of extensions for the mask enable independent movement of the wafer and the mask. In one embodiment, the extensions are affixed to an annular ring which is capable of moving in a vertical direction within the processing chamber. A processing chamber, a mask, and a method for combinatorially processing a substrate are also provided.
Claims19
A process module comprising:
- a multi-level support structure comprising a clamp ring and a lift hoop, wherein the lift hoop is operable to lift a mask against a support surface of the clamp ring;
- and
- a pedestal disposed within a cavity defined by the lift hood wherein the pedestal is operable to support a substrate and to lift the substrate against a bottom surface of the mask and wherein the pedestal is further operable to lift the substrate until the mask contacts a support surface of the clamp ring.
A method of processing multiple regions of a substrate comprising:
- supporting a mask having a window therethrough on a lift hoop wherein the lift hoop is operable to lift the mask against a support surface of a clamp ring;
- supporting a substrate on a pedestal wherein the pedestal is operable to lift the substrate against a bottom surface of the mask and wherein the pedestal is further operable to lift the substrate until the mask contacts the support surface of the clamp ring;
- processing a first region on the substrate defined by the window;
- lowering at least the pedestal;
- changing the orientation of at least one of the mask or substrate;
- raising at least the pedestal;
- and
- processing a second region on the substrate defined by the window.
Dependencies are inferred from the claim text.