Method for forming dye sublimation images in solid substrates
AssigneeFresco Technologies, Inc.
InventorsJonathan Drake, John Moalli
Life of this patent
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Abstract
A method for forming a dye sublimation image in a plastic substrate with a sheet having an image formed thereon of a sublimatic dyestuff is provided. The image on the sheet with a treatment that deposits a silicon compound is placed against a first surface of the substrate. The sheet is heated to a sublimation temperature, which causes the image of the sheet to sublimate into the substrate. The sheet is cooled to a release temperature. The sheet is removed from the substrate.
Claims16
A method for forming a dye sublimation image in a plastic substrate with a sheet having an image formed thereon of a sublimatic dyestuff and with a treatment that deposits a silicon compound on the sheet, the method comprising:
- placing the image on the sheet with the treatment against a first surface of the substrate;
- heating the sheet to a sublimation temperature, which causes the image of the sheet to sublimate into the substrate, wherein the image is sublimated into the first surface of the substrate;
- cooling the sheet to a release temperature;
- and
- removing the sheet from the substrate, wherein the plastic substrate is a thermoplastic substrate.
A method for forming a dye sublimation image in a plastic substrate comprising:
- treating a sheet of paper with a treatment that deposits a silicon compound;
- placing an image on the treated sheet of paper;
- placing the image on the treated sheet against a first surface of the substrate, wherein the plastic substrate is a thermoplastic substrate;
- heating the treated sheet to a sublimation temperature, which causes the image of the treated sheet to sublimate into the substrate;
- cooling the treated sheet to a release temperature;
- and
- removing the treated sheet from the substrate.
A method for forming a dye sublimation image in a thermoplastic substrate comprising:
- treating a sheet of paper with a treatment that deposits a silicon compound, wherein the treating the sheet of paper, comprises:
- forming a coating of a silicon compound on surfaces of the sheet of paper;
- and
- drying the coating of silicon compound, wherein a weight of the coating of silicon compound is between 0.05% to 5.0% of a weight of the sheet of paper;
- placing an image on the treated sheet of paper;
- placing the image on the treated sheet against a first surface of the substrate;
- heating the treated sheet to a sublimation temperature, which causes the image of the treated sheet to sublimate into the substrate;
- cooling the treated sheet to a release temperature;
- and
- removing the treated sheet from the substrate.
Dependencies are inferred from the claim text.