System and method for correcting systematic parametric variations on integrated circuit chips in order to minimize circuit limited yield loss

A system for correcting systematic parametric variations on an integrated circuit chip, said system comprising:

• a laser anneal tool;
• a data storage device storing a map of an integrated circuit chip, said integrated circuit chip having a given design and comprising a plurality of devices, said map indicating variations in threshold voltage for said devices across different regions of said integrated circuit chip as a result of said given design, said data storage device further storing information indicating a relative impact, on said threshold voltage, of changes in an amount of laser anneal energy associated with a laser anneal process performed by said laser anneal tool in manufacturing said integrated circuit chip according to said given design;
• a processor accessing said data storage device and determining, based on said information and using said map as a guide, different laser anneal energy amounts, each one of said different laser anneal energy amounts to be used in a corresponding one of said different regions as said laser anneal process is performed by said laser anneal tool during said manufacturing of said integrated circuit chip according to said given design in order to offset said variations in said threshold voltage;
• and
• a controller receiving said different values for said laser anneal energy and controlling said laser anneal tool as said laser anneal process is performed by said laser anneal tool during said manufacturing of said integrated circuit chip according to said given design such that said different values for said laser anneal energy are used in said different regions.

A method of correcting systematic parametric variations on an integrated circuit chip, said method comprising:

• generating, and storing in a data storage device, a map of an integrated circuit chip,
• said integrated circuit chip having a given design and comprising a plurality of devices, and
• said map indicating variations in a device parameter for said devices across different regions of said integrated circuit chip as a result of said given design;
• accessing, by a processor from said data storage device, said map and information indicating a relative impact, on said device parameter, of changes in a specification associated with a process step used in manufacturing said integrated circuit chip according to said given design;
• and
• based on said information and using said map as a guide, determining, by said processor, different values for said specification, each one of said different values to be used in a corresponding one of said different regions as said process step is performed during said manufacturing of said integrated circuit chip according to said given design in order to offset said variations in said device parameter.

A method of correcting systematic parametric variations on an integrated circuit chip, said method comprising:

• generating, and storing in a data storage device, a map of an integrated circuit chip,
• said integrated circuit chip having a given design and comprising a plurality of devices, and
• said map indicating variations in threshold voltage for said devices across different regions of said integrated circuit chip as a result of said given design;
• accessing, by a processor from said data storage device, said map and information indicating a relative impact, on said threshold voltage, of changes in an amount of laser anneal energy associated with a laser anneal process used in manufacturing said integrated circuit chip according to said given design;
• and
• based on said information and using said map as a guide, determining, by said processor, different laser anneal energy amounts, each one of said different laser anneal energy amounts to be used in a corresponding one of said different regions as said laser anneal process is performed during manufacturing of said integrated circuit chip according to said given design in order to offset said variations in said threshold voltage.