Apparatus for data analysis
AssigneeHitachi High-Technologies Corporation
InventorsAtsuko Yamaguchi, Hiroki Kawada
Life of this patent
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AssigneeHitachi High-Technologies Corporation
InventorsAtsuko Yamaguchi, Hiroki Kawada
Estimating the term…
Edge points are extracted by specifying a height (values indicating a distance from a substrate) on a pattern when edges of the pattern are extracted from a CD-SEM image. Further, LER values obtained by the extraction of a Fourier spectrum of the LER are obtained. When the same sample is previously observed with the AFM and the CD-SEM, a size of the LER obtained by specifying a height, an auto-correlation distance of the LER, or an index called the spectrum is obtained from results of the AFM observation. Further, theses indices obtained by specifying image processing conditions for detecting the edge points from the CD-SEM observation result are obtained. Also, it is determined that heights providing values when the values are matched correspond to the image processing conditions and then, the edge points are extracted from the CD-SEM IMAGE instead of the AFM observation by using the image processing conditions.
An apparatus for data analysis comprising;
A method for data analysis comprising:
Dependencies are inferred from the claim text.