Image sensing device and method of

An image sensor comprising a two dimensional array of sensor elements formed in a semiconductor substrate, each one of the sensor elements comprising:

• a radiation transparent insulating layer formed on the semiconductor substrate,
• an electrode formed as a layer of transparent resistive material on the insulating layer, the transparent resistive material extending across a photosensitive part of the image sensor element in which modulated incident light is converted into photogenerated charges,
• a first contact adjacent to a first edge of the resistive layer,
• a first diffusion region in the semiconductor substrate of opposite conductivity to the semiconductor substrate located adjacent to the first contact and biased to a higher potential than that of the first contact, and
• a second contact adjacent to a second edge, opposite the first edge, of the resistive layer,
• a second diffusion region in the semiconductor substrate of opposite conductivity to the semiconductor substrate located adjacent to the second contact and biased to a higher potential than that of the second contact, the image sensor further comprising:
• a signal generator, connected to the first contact and the second contact of the sensor elements, supplying time-dependent voltage patterns in synchronism with a modulation of the modulated incident light that generate a current through the transparent resistive material to generate a two dimensional potential distribution in the semiconductor substrate to transport the photogenerated charges alternately to the first diffusion region and the second diffusion region synchronously with the modulation of the modulated incident light.