Laser dicing apparatus and dicing method
AssigneeTokyo Seimitsu Co., Ltd.
InventorRyosuke Ito
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AssigneeTokyo Seimitsu Co., Ltd.
InventorRyosuke Ito
Estimating the term…
Performing a high precision dicing without being affected by a step on a wafer surface, and preventing a particle generation caused by ablation is enabled. A laser dicing apparatus (10), which forms a reformed layer in a wafer (W) by irradiating the wafer (W) with a laser beam, includes: a condensing lens (26) that condenses the laser beam; an astigmatic optical measuring section (29) that measures an unevenness of a surface of the wafer (W) based on the laser beam radiated by a laser oscillating apparatus (21); an actuator (27) that moves the condensing lens (26) to adjust the position of the condensing point of the laser beam; and a control section (50) that controls the actuator (27). The control section (50) switches between a control based on the unevenness measured by the astigmatic optical measuring section (29) and a control for maintaining the position of the condensing lens (26) constant, in accordance with the position of the laser beam.
A laser dicing apparatus which forms a reformed region in a wafer by irradiating the wafer with a laser beam, the laser dicing apparatus comprising:
A dicing method of a wafer by use of a laser dicing apparatus including a laser beam radiating section that radiates a laser beam, a light condensing section that condenses the laser beam inside the wafer, and a laser beam moving section that moves the laser beam with respect to the wafer, the dicing method comprising:
Dependencies are inferred from the claim text.