Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition
AssigneeAdvanced Technology Materials, Inc.
InventorsRobin A. Gardiner, Thomas H. Baum, Douglas Cameron Gordon, Timothy E. Glassman, Sofia Pombrik, Brian A. Vaartstra, Peter S. Kirlin
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Abstract
A β-diketonate alkoxide metal compound and a source reagent composition are provided. The β-diketonate alkoxide metal compound may include a metal M selected from Mg, Ca, Sr, Ba, Sc, Y, La, Ce, Ti, Zr, Hf, Pr, V, Nb, Ta, Nd, Cr, W, Pm, Mn, Re, Sm, Fe, Ru, Eu, Co, Rh, Ir, Gd, Ni, Tb, Cu, Dy, Ho, Al, Tl, Er, Sn, Pb, Tm, Bi, Lu, Th, Pd, Pt, Ga, In, Au, Ag, Li, Na, K, Rb, Cs, Mo, and Yb. The metal may be complexed to at least one alkoxide ligand and one β-diketonate ligand.
Claims9
A β-diketonate alkoxide metal compound including a metal M selected from the group consisting of Zr, and Hf, wherein the metal is complexed to (i) at least one butoxy or isopropoxy ligand and (ii) at least one tetramethylheptanedionate ligand, wherein the compound is sufficiently volatile to yield a metal source vapor.
A source reagent composition,
- comprising Hf(iOPr)2(thd)2
- wherein OiPr=isopropoxy and thd=tetramethylheptanedionate.
Dependencies are inferred from the claim text.