Process for removing residual monomers from water-absorbing polymer particles
AssigneeBASF SE
InventorsRobert Wengeler, Karin Flore
Life of this patent
Estimating the term…
Abstract
A process for removing residual monomers from water-absorbing polymer particles, wherein the water-absorbing polymer particles are thermally aftertreated in a mixer with rotating mixing tools at a temperature of at least 60° C. in the presence of water vapor.
Claims11
A process for removing residual monomers from water-absorbing polymer particles, which comprises thermally aftertreating the water-absorbing polymer particles in a mixer with rotating mixing tools in the presence of a gas stream, said water-absorbing polymer particles having a temperature of at least 60° C. and a moisture content of at least 3% by weight during the thermal aftertreatment, and said gas stream comprising at least 0.01 kg of water vapor per kg of dry gas.
Dependencies are inferred from the claim text.