Method for manufacturing coating film with coating liquid
AssigneeTokyo Electron Limited
InventorHiroshi Sato
Life of this patent
Estimating the term…
Abstract
Method for manufacturing a semiconductor device, which may include (a) forming a coating film on a substrate by applying a coating liquid including a polymer conductive material dissolved in an insulating solvent on the substrate after the step (a); (b) heat-treating the coating film; and (c) forming, before or after the steps (a) and (b), a gate electrode on the substrate. Herein, a surface layer portion is an insulating layer, and an inner layer portion is an organic semiconductor layer, and the surface layer portion and the inner layer portion are formed separate from each other to allow the surface layer portion and the inner layer portion to be used as a gate insulating film and a channel of a field-effect transistor, respectively.
Claims6
A method for manufacturing a semiconductor device, the method comprising the steps of:
- (a) forming a copolymer coating film on a substrate by applying a coating liquid comprising a polymer conductive material dissolved in an insulating solvent on the substrate;
- (b) heat-treating the coating film after the step (a);
- and
- (c) forming, before or after the steps (a) and (b), a gate electrode on the substrate,
- wherein the copolymer coating film is separated into a surface layer portion is an insulating layer, and an inner layer portion an organic semiconductor layer,
- wherein the polymer conductive material is in the surface layer portion and the inner layer portion, and
- wherein the surface layer portion is used as a gate insulating film and the inner layer portion is used as a channel of a field-effect transistor,
- wherein a concentration ratio of the polymer conductive material to the insulating solvent in the inner layer portion is larger than that of the polymer conductive material to the insulating solvent in the surface layer portion.
Dependencies are inferred from the claim text.