Array substrate and method for manufacturing the array substrate

A method for manufacturing an array substrate, the method comprising:

• sequentially disposing a first metal layer and a second metal layer on a base substrate on which a gate line, a gate electrode and a channel layer are disposed;
• sequentially etching the second metal layer and the first metal layer to form a metal line pattern, the metal line pattern including a first line pattern, a second line pattern and a first electrode pattern, the first electrode pattern including a first element pattern and a second element pattern;
• partially etching the second element pattern to form a second electrode pattern, the second electrode pattern comprising the first element pattern and a partially etched second element pattern;
• partially etching the second line pattern to form a data line, the data line comprising the first line pattern and a partially etched second line pattern;
• converting an oxide layer to a fluoride layer by contacting the oxide layer with a reactive gas, the reactive gas comprising a fluoride containing compound, the oxide layer being naturally formed on the first element pattern when forming the second electrode pattern;
• etching the fluoride layer and an exposed portion of the first element pattern to form a source electrode electrically connected to the data line and a drain electrode spaced apart from the source electrode;
• and
• disposing a pixel electrode to electrically contact the drain electrode.