Photoelectric conversion device, imaging device, and process for producing the photoelectric conversion device
AssigneeFUJIFILM Corporation
InventorMikio Ihama
Life of this patent
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Abstract
A photoelectric conversion device comprising: a semiconductor substrate; an inorganic photoelectric conversion layer provided within the semiconductor substrate; and an organic photoelectric conversion layer provided above the inorganic photoelectric conversion layer, wherein the organic photoelectric conversion layer is prepared by a shadow mask method.
Claims1
A process for producing a photoelectric conversion device including a semiconductor substrate, an inorganic photoelectric conversion layer provided within the semiconductor substrate, an organic photoelectric conversion layer provided above the inorganic photoelectric conversion layer, a connection electrode provided above the semiconductor substrate, at least one counter electrode which is in contact with the organic photoelectric conversion layer and is directly connected to the connection electrode, and plural pixel electrodes which are in contact with the organic photoelectric conversion layer, wherein a distance between the connection electrode and the pixel electrode located in the closest position to the connection electrode is from 10 μm to 3 mm and the connection electrode is provided between the semiconductor substrate and the at least one counter electrode, the process comprising:
- producing the organic photoelectric conversion layer by a shadow mask method;
- and producing the at least one counter electrode by a shadow mask method so that the at least one counter electrode is in contact with the organic photoelectric conversion layer and is connected to the connection electrode.
Dependencies are inferred from the claim text.