Transparent conductor based pinned photodiode
AssigneeMicron Technology, Inc.
InventorsChandra Mouli, Howard E. Rhodes
Life of this patent
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AssigneeMicron Technology, Inc.
InventorsChandra Mouli, Howard E. Rhodes
Estimating the term…
A pinned photodiode with improved short wavelength light response. In exemplary embodiments of the invention, a gate oxide is formed over a doped, buried region in a semiconductor substrate. A gate conductor is formed on top of the gate oxide. The gate conductor is transparent, and in one embodiment is a layer of indium-tin oxide. The transparent conductor can be biased to reduce the need for a surface dopant in creating a pinned photodiode region. The biasing of the transparent conductor produces a hole-rich accumulation region near the surface of the substrate. The gate conductor material permits a greater amount of charges from short wavelength light to be captured in the photo-sensing region in the substrate, and thereby increases the quantum efficiency of the photosensor.
A method of forming a pixel sensor cell comprising:
A method of forming a photosensor, said method comprising the steps of:
A method of operating a pixel sensor cell, said method comprising the acts of:
Dependencies are inferred from the claim text.