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US 8,298,743 B2Granted
Positive-type photosensitive composition, transparent conductive film, display element and integrated solar battery
AssigneeFUJIFILM Corporation
InventorsKenji Naoi, Yoichi Hosoya, Nori Miyagishima
Life of this patent
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Abstract
A positive-type photosensitive composition including an alkali-soluble polymer formed through copolymerization of monomer (A) represented by the following General Formula (I) and other radical polymerizable monomer (B), a 1,2-quinonediazide compound, and a nanowire structure: where R1 represents a hydrogen atom or a methyl group, R2 represents a hydrogen atom or a C1 to C5 alkyl group, n is an integer of 1 to 5, and m is an integer of 1 to 7.
Claims28
A positive-type photosensitive composition comprising:
- an alkali-soluble polymer formed through copolymerization of monomer (A) represented by the following General Formula (I) and other radical polymerizable monomer (B),
- a 1,2-quinonediazide compound, and
- a nanowire structure dispersed in the positive-type photosensitive composition:
- where R1 represents a hydrogen atom or a methyl group, R2 represents a hydrogen atom or a C1 to C5 alkyl group, n is an integer of 1 to 5, and m is an integer of 1 to 7.
1 more element
A positive-type photosensitive composition comprising:
- an alkali-soluble polymer formed through copolymerization of monomer (A) represented by the following General Formula (II) and other radical polymerizable monomer (B),
- a 1,2-quinonediazide compound, and
- a nanowire structure dispersed in the positive-type photosensitive composition:
- where R1 represents a hydrogen atom or a methyl group, R2 represents a hydrogen atom or a C1 to C5 alkyl group, and n is an integer of 1 to 5.
1 more element
A positive-type photosensitive composition comprising:
- an alkali-soluble polymer formed through copolymerization of monomer (A) represented by General Formula (II), at least one selected as oxetanyl-containing radical polymerizable monomer (b1) from (3-ethyl-3-oxetanyl)methyl acrylate and (3-ethyl-3-oxetanyl)methyl methacrylate, at least one selected as oxyranyl-containing radical polymerizable monomer (b2) from glycidyl(meth)acrylate, methylglycidyl(meth)acrylate, α-ethylacrylic acid glycidyl ester and 3,4-epoxycyclohexyl(meth)acrylate, and at least one selected as hydroxyl group-containing radical polymerizable monomer (b3) from 2-hydroxylethyl acrylate, 2-hydroxylethyl methacrylate, 2-hydroxylpropylacrylate and 2-hydroxylpropyl methacrylate,
- 4,4′-[1-[4-[1-[4-hydroxylphenyl]-1-methylethyl]phenyl]ethylidene]bisphenol-1,2-naphthoquinone diazide-5-sulfonic acid ester as a 1,2-quinonediazide compound, and
- a nanowire structure dispersed in the positive-type photosensitive composition:
- where R1 represents a hydrogen atom or a methyl group, R2 represents a hydrogen atom or a C1 to C5 alkyl group, and n is an integer of 1 to 5.
1 more element
A positive-type photosensitive composition comprising:
- an alkali-soluble polymer formed through copolymerization of monomer (A) represented by General Formula (II), at least one selected as oxetanyl-containing radical polymerizable monomer (b1) from (2-ethyl-2-oxetanyl)methyl acrylate and (2-ethyl-2-oxetanyl)methyl methacrylate, at least one selected from as oxyranyl-containing radical polymerizable monomer (b2) from glycidyl(meth)acrylate, methylglycidyl(meth)acrylate, ethylacrylic acid glycidyl ester and 3,4-epoxycyclohexyl(meth)acrylate, and at least one selected as hydroxyl group-containing radical polymerizable monomer (b3) from 2-hydroxylethyl acrylate, 2-hydroxylethyl methacrylate, 2-hydroxylpropyl acrylate and 2-hydroxylpropyl methacrylate;
- 4,4′-[1-[4-[1-[4-hydroxylphenyl]-1-methylethyl]phenyl]ethylidene]bisphenol-1,2-naphthoquinone diazide-5-sulfonic acid ester as a 1,2-quinonediazide compound, and
- a nanowire structure dispersed in the positive-type photosensitive composition:
- where R1 represents a hydrogen atom or a methyl group, R2 represents a hydrogen atom or a C1 to C5 alkyl group, and n is an integer of 1 to 5.
1 more element
A transparent conductive film comprising:
- a positive-type photosensitive composition which comprises an alkali-soluble polymer formed through copolymerization of monomer (A) represented by the following General Formula (I) and other radical polymerizable monomer (B), a 1,2-quinonediazide compound, and
- a nanowire structure dispersed in the positive-type photosensitive composition:
- where R1 represents a hydrogen atom or a methyl group, R2 represents a hydrogen atom or a C1 to C5 alkyl group, n is an integer of 1 to 5, and m is an integer of 1 to 7.
Dependencies are inferred from the claim text.