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AssigneeApplied Microstructures, Inc.
InventorsBoris Kobrin, Jeffrey D. Chinn, Romuald Nowak, Richard C. Yi
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An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and a SAM organic-based layer is directly deposited over the oxide-based layer. Typically a series of alternating layers of oxide-based layer and organic-based layer are applied.
A method of depositing a multilayered coating on a substrate, which coating is tailored to provide a particular characteristic behavior, wherein all layers of said multilayered coating are deposited from a vapor phase, wherein said multilayered coating includes at least one oxide-based layer and at least one organic-based layer, wherein the depositing from the vapor phase employs a stagnant source of reactive moieties during the formation of at least one layer, or a portion of at least one layer, of the multilayered coating, and wherein the stagnant source of reactive moieties is charged to a process chamber, without further addition during formation of the at least one layer or the portion of at least one layer, wherein said oxide-based layer is comprised of an oxide selected from the group consisting of silicon oxide, aluminum oxide, zirconium oxide, titanium oxide, nickel oxide, tin oxide, and combinations thereof.
Dependencies are inferred from the claim text.