Cleaning device and cleaning method of semiconductor manufacturing apparatus

A cleaning device for removing deposits or particles adhered to parts in a processing chamber of a semiconductor manufacturing apparatus, the device comprising:

• a pure water steam generating vessel configured to store pure water and generate pure water steam from the pure water;
• a supply port configured to supply the pure water steam to a cleaning target portion;
• a supply line, made of a pliable material, configured to connect the pure water steam generating vessel with the supply port;
• a collection port installed around the supply port and configured to collect steam used in cleaning from the cleaning target portion;
• a collection vessel configured to condense and collect the used steam;
• and
• a collection line, made of a pliable material, configured to connect the collection port with the collection vessel,
• wherein a contact surface of the pure water steam generating vessel with the pure water is made of resin, and a contact surface of the supply line with the pure water steam is made of resin,
• the collection port has an opening end making contact with the cleaning target portion where cleaning target surfaces of an angled portion of a member intersect, and
• the opening end has a protruded shape in an inverse-V shape as a whole.