Systematic method for variable layout shrink

A method for integrated circuit design, the method comprising:

• providing a layout of an integrated circuit;
• determining key parameters of the integrated circuit;
• determining design specifications of the key parameters;
• performing a first shrinkage to the layout using a first shrink percentage to generate a first shrunk layout;
• evaluating the first shrunk layout by generating first values of the key parameters from the first shrunk layout;
• performing a second shrinkage to the layout using a second shrink percentage greater than the first shrink percentage to generate a second shrunk layout;
• evaluating the second shrunk layout by generating second values of the key parameters from the second shrunk layout, wherein the second values of the key parameters are generated using a computer;
• finding a portion of the second values failing to meet respective ones of the design specifications;
• and
• determining guidelines for tuning manufacturing processes of the second shrunk layout, so that all of the key parameters meet the design specifications.

A method for integrated circuit design, the method comprising:

• providing a layout of an integrated circuit;
• determining key parameters of the integrated circuit;
• determining design specifications of the key parameters;
• determining a plurality of candidate shrink percentages different from each other;
• and
• for each of the plurality of candidate shrink percentages, repeating steps of:
• performing a shrinkage of the layout using the each of the plurality of candidate shrink percentages to generate a shrunk layout;
• evaluating the shrunk layout by generating values of the key parameters from the shrunk layout, wherein the values of the key parameters are generated using a computer;
• finding a portion of the key parameters failing to meet respective ones of the design specifications;
• and
• determining guidelines for tuning manufacturing processes of the shrunk layout, wherein the guidelines are selected from the group consisting essentially of a global tuning and a local tuning.