Displacement measurement method and apparatus thereof, stage apparatus, and probe microscope
AssigneeHitachi, Ltd.
InventorsToshihiko Nakata, Masahiro Watanabe, Shuichi Baba, Mineo Nomoto
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AssigneeHitachi, Ltd.
InventorsToshihiko Nakata, Masahiro Watanabe, Shuichi Baba, Mineo Nomoto
Estimating the term…
The present invention provides a displacement measurement method, an apparatus thereof, a probe microscope. which make it possible to stably measure an amount of displacement and a moving distance of an object under measurement with an accuracy of the sub-nanometer order or below without being affected by disturbances such as fluctuations of air, mechanical vibration. Specifically, with the present invention, a pulsed beam is split into two; one beam is reflected by an object under measurement and then inputted to a delay optical path equivalent to one pulse period; and the other beam is sent through the same delay optical path in the opposite direction up to the object under measurement with a delay of one pulse period, and then reflected by the object under measurement. Then, an optical phase variation caused by the movement of the object under measurement is obtained by subjecting the two pulsed beams to interference.
A displacement measurement method comprising the steps of:
A displacement measurement method comprising the steps of:
A displacement measurement apparatus comprising:
A displacement measurement apparatus comprising:
A displacement measurement apparatus comprising:
Dependencies are inferred from the claim text.