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US 8,284,017 B2Granted
Structure having substantially parallel resistor material lengths
AssigneeInternational Business Machines Corporation
InventorsMark C. Hakey, Stephen E. Luce, James S. Nakos
Life of this patent
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Abstract
A design structure including a pair of substantially parallel resistor material lengths separated by a first dielectric are disclosed. The resistor material lengths have a sub-lithographic dimension and may be spacer shaped.
Claims14
A design structure embodied in a machine readable medium for designing, manufacturing, or testing an integrated circuit, the design structure comprising:
- a resistor including a pair of substantially parallel resistor material lengths separated by a first dielectric and positioned adjacent to a sidewall of a trench in a second dielectric,
- wherein each of the pair of substantially parallel resistor material lengths has a serpentine layout;
- a first contact coupled to a first end of each of the pair of substantially parallel resistor material lengths;
- and
- a second contact coupled to a second end of each of the pair of substantially parallel resistor material lengths.
2 more elements
A design structure embodied in a machine readable medium for designing, manufacturing, or testing an integrated circuit, the design structure comprising:
- a resistor including a resistor material length positioned along a sidewall of a trench structure, the resistor material length having a spacer shape and a sub-lithographic thickness,
- wherein the resistor material length includes a pair of substantially parallel resistor material lengths;
- a first contact coupled to a first end of each of the pair of substantially parallel resistor material lengths;
- and
- a second contact coupled to a second end of each of the pair of substantially parallel resistor material lengths.
2 more elements
Dependencies are inferred from the claim text.