Systems and methods for drive laser beam delivery in an EUV light source
AssigneeCymer, Inc.
InventorsWilliam N. Partlo, Igor V. Fomenkov, Jason Paxton
Life of this patent
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Abstract
An EUV light source device is described herein which may comprise a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis; a material for interaction with the laser beam at an irradiation site to create an EUV light emitting plasma; a first reflector having a focal point, the first reflector positioned with the focal point on the linear axis, the first reflector receiving laser light along the beam path; and a second reflector receiving laser light reflected by the first reflector and directing the laser light toward the irradiation site.
Claims28
An EUV light source comprising;
- a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis;
- a material for interaction with the laser beam at an irradiation site to create an EUV light emitting plasma;
- a first reflector having a focal point, the first reflector positioned with the focal point on the linear axis, the first reflector receiving laser light along the beam path;
- a second reflector receiving laser light reflected by said first reflector and directing the laser light toward said irradiation site;
- and
- an adaptive optic adjustable to selectively vary beam width and divergence of the laser beam at the first reflector.
An EUV light source comprising;
- an optic for reflecting light of wavelength λ1, and transmitting light of wavelength λ2, with λ1≠λ2,
- a material cooperating with said optic to establish an optical cavity therebetween when said material is at an irradiation site;
- a gain medium excitable to establish optical gains exceeding optical losses in said cavity to generate a laser beam for irradiating said material to produce an EUV light emission;
- an alignment laser positioned to pass an alignment laser beam having a wavelength, λ2, through the reflective optic;
- and
- a monitor receiving said alignment laser beam to verify an alignment of at least one optic in said cavity.
An EUV light source comprising;
- a laser beam travelling along a beam path;
- an optic focusing said laser beam to an irradiation site on the beam path;
- a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma;
- a monitor measuring a beam parameter and outputting a signal indicative thereof;
- and
- an adaptive optic responsive to the signal for modifying the laser beam to have a pre-selected beam divergence and beam width at the focusing optic.
An EUV light source comprising;
- a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis;
- a material for interaction with the laser beam at an irradiation site to create an EUV light emitting plasma;
- a first reflector having a focal point, the first reflector positioned with the focal point on the linear axis, the first reflector receiving laser light along the beam path;
- a second reflector receiving laser light reflected by said first reflector and directing the laser light toward said irradiation site;
- and
- a laser device generating said laser beam, said laser device comprising at least one reflective optic establishing a beam path through the irradiation site and wherein said material cooperates with said optic to establish an optical cavity therebetween when said material is at said irradiation site, and wherein said laser device further comprises a gain medium excitable to establish optical gains exceeding optical losses in said cavity to generate a laser beam for irradiating said material, wherein said reflective optic transmit light at a wavelength, λ, and said EUV light source further comprises an alignment laser passing an alignment laser beam having a wavelength, λ, through the reflective optic and a monitor receiving said alignment laser beam after reflection from said second reflector.
Dependencies are inferred from the claim text.