Back to results
US 8,283,108 B2Granted
Method of applying patterned metallization to block filter resonators
AssigneeResearch In Motion RF, Inc.
InventorsLuna H. Chiu, Chen Zhang, John King, Barry Treadway, George Kang
Life of this patent
Estimating the term…
Abstract
An embodiment of the present invention provides a method of applying patterned metallization to a ceramic block comprising applying a photodefinable ink to said ceramic block; drying said ink; exposing said photodefinable ink to UV radiation through a predefined mask according to the thickness of the film to form a pattern; developing said pattern in a developer solution thereby forming a patterned ceramic block; and rinsing, drying and firing said patterned ceramic block.
Claims20
A method comprising:
- obtaining a ceramic block comprising a dielectric material;
- applying a photodefinable ink made of a photosensitive metal ink containing metal particles and photosensitive organic compounds to a surface of the dielectric material of said ceramic block to form a photodefinable layer on the surface of the dielectric material of the ceramic block;
- drying the photodefinable layer;
- exposing for a predetermined amount of time a portion of the photodefinable layer to UV radiation through a predefined mask based on a film thickness resulting in an organic-metal particles containing-composition pattern on the surface of the dielectric material of the ceramic block;
- applying a developer solution to an unexposed portion of the photodefinable layer to dissolve the unexposed portion of the photodefinable layer on the surface of the dielectric material of the ceramic block;
- rinsing the organic-metal particles containing-composition pattern on the surface of the dielectric material of the ceramic block;
- and
- drying the ceramic block having the organic-metal particles containing-composition pattern on the surface of the dielectric material thereof.
5 more elements
A method comprising:
- obtaining a ceramic block comprising a dielectric material and a metalized through-hole, wherein the metalized through-hole extends entirely through the ceramic block between opposing sides of the ceramic block;
- applying a photodefinable metal paste to a surface of the ceramic block including contact with the dielectric material to form a photodefinable layer on the surface of the ceramic block, wherein the photodefinable metal paste comprises metal particles and photosensitive organic compounds;
- drying the photodefinable layer;
- exposing for a predetermined amount of time a portion of the photodefinable layer to UV radiation through a predefined mask based on a film thickness resulting in an organic-metal particles containing-composition pattern on the surface of the ceramic block that is in contact with the metalized through-hole;
- applying a developer solution to an unexposed portion of the photodefinable layer to dissolve the unexposed portion of the photodefinable layer on the surface of the ceramic block;
- rinsing the organic-metal particles containing-composition pattern on the surface of the ceramic block;
- and
- firing the ceramic block having the organic-metal particles containing-composition pattern on the surface thereof.
5 more elements
A method comprising:
- obtaining a ceramic block comprising a plurality of sides, a dielectric material and a metalized through-hole, wherein the metalized through-hole extends entirely through the ceramic block between opposing sides of the plurality of sides of the ceramic block;
- applying a photodefinable metal paste to at least two sides of the plurality of sides of the ceramic block including contact with the dielectric material to form a photodefinable layer on a surface of the dielectric material of the ceramic block, wherein the photodefinable metal paste comprises metal particles and photosensitive organic compounds;
- drying the photodefinable layer;
- exposing for a predetermined amount of time a portion of the photodefinable layer to UV radiation through a predefined mask based on a film thickness resulting in an organic-metal particles containing-composition pattern on the surface of the dielectric material of the ceramic block that is in contact with the metalized through-hole;
- applying a developer solution to an unexposed portion of the photodefinable layer to dissolve the unexposed portion of the photodefinable layer on the surface of the dielectric material of the ceramic block;
- rinsing the organic-metal particles containing-composition pattern on the surface of the dielectric material of the ceramic block;
- and
- firing the ceramic block having the organic-metal particles containing-composition pattern on the surface of the dielectric material thereof.
5 more elements
Dependencies are inferred from the claim text.