A photoacid generator for a chemically amplified resist material, which is sensitive to a high-energy radiation selected from ultraviolet ray, far-ultraviolet ray, extreme-ultraviolet ray, electron beam, X-ray, excimer laser, γ-ray and synchrotron radiation and is capable of generating a fluorinated sulfonic acid of the following general formula (2) by exposure to the high-energy radiation
- where n indicates an integer of 1 to 10;
- and R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group.