Laminate film and composite film
AssigneeFUJIFILM Corporation
InventorShigehide Itou
Life of this patent
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Abstract
A laminate film having excellent barrier property is provided. The laminate film comprises a substrate film, an organic layer and an inorganic layer in that order, wherein the organic layer has a thickness of 300 nm to 2000 nm, the inorganic layer comprises silicon oxide represented by SiOx, wherein x is in a range from 0.9 to 1.5, and the organic layer has a surface satisfying Ra (100 μm square)<50 nm, Ra (10 μm square)<2 nm, and 75 nm<Rz (100 μm square)<300 nm.
Claims20
A laminate film comprising a substrate film, an organic layer and an inorganic layer in that order, wherein the organic layer has a thickness of 300 nm to 2000 nm, the inorganic layer comprises silicon oxide represented by SiOx, wherein x is in a range from 0.9 to 1.5, and the organic layer has a surface satisfying all the following formulae;
- Ra(100 μm square)<50 nm
- Ra(10 μm square)<2 nm
- 75 nm<Rz(100 μm square)<300 nm.
A composite film comprising two laminate films each comprising a substrate film, an organic layer and an inorganic layer in that order, wherein the laminate films adhere to each other at a side of its inorganic layer, and the laminate films each satisfy as follows;
- the organic layer has a thickness of 300 nm to 2000 nm,
- the inorganic layer comprises silicon oxide represented by SiOx, wherein x is in a range from 0.9 to 1.5, and
- the organic layer has a surface satisfying all the following formulae;
- Ra(100 μm square)<50 nm
- Ra(10 μm square)<2 nm
- 75 nm<Rz(100 μm square)<300 nm.
A back sheet for a solar cell comprising a laminate film comprising a substrate film, an organic layer and an inorganic layer in that order, wherein the organic layer has a thickness of 300 nm to 2000 nm, the inorganic layer comprises silicon oxide represented by SiOx, wherein x is in a range from 0.9 to 1.5, and the organic layer has a surface satisfying all the following formulae;
- Ra(100 μm square)<50 nm
- Ra(10 μm square)<2 nm
- 75 nm<Rz(100 μm square)<300 nm.
A method for producing a laminate film comprising a substrate film, an organic layer and an inorganic layer in that order, wherein the organic layer has a thickness of 300 nm to 2000 nm, the inorganic layer comprises silicon oxide represented by SiOx, wherein x is in a range from 0.9 to 1.5, and the organic layer has a surface satisfying all the following formulae;
- Ra(100 μm square)<50 nm
- Ra(10 μm square)<2 nm
- 75 nm<Rz(100 μm square)<300 nm, and
- which comprises transferring the substrate film by roll to roll processing.
Dependencies are inferred from the claim text.