Flow-fill spacer structures for flat panel display device
AssigneeMosaid Technologies Incorporated
InventorBrian A. Vaartstra
Life of this patent
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Abstract
A preferred embodiment of the invention is directed to support structures such as spacers used to provide a uniform distance between two layers of a device. In accordance with a preferred embodiment, the spacers may be formed utilizing flow-fill deposition of a wet film in the form of a precursor such as silicon dioxide. Formation of spacers in this manner provides a homogenous amorphous support structure that may be used to provide necessary spacing between layers of a device such as a flat panel display.
Claims11
A method of forming a structure on a display component, comprising:
- depositing photoresist on the display component;
- forming an opening in the photoresist, wherein the opening extends to the substrate;
- and
- flow-fill depositing a substantially liquid sol-gel precursor in the opening.
A method of fabricating a flat panel display having a cathode and a faceplate, comprising:
- depositing a first photoresist on the faceplate;
- depositing a patterned second photoresist on the first photoresist, wherein the second photoresist exposes a portion of the first photoresist;
- exposing the second photoresist and the portion of the first photoresist to a light source;
- removing exposed portions of the first and second photoresist, wherein removing defines an opening in the first photoresist down to the faceplate;
- flow-fill depositing a wet sol-gel on the first photoresist and in the opening;
- baking the sol-gel into a solid silicon oxide;
- removing the silicon oxide on the first photoresist while retaining the silicon oxide in the opening;
- removing remains of the first photoresist while retaining remains of the silicon oxide;
- and
- assembling the flat panel display with the cathode and the faceplate separated by the spacers.
Dependencies are inferred from the claim text.