Shower head and plasma processing apparatus having same
AssigneeTokyo Electron Limited
InventorHachishiro Iizuka
Life of this patent
Estimating the term…
Abstract
A shower head is provided, in a processing chamber in which a substrate is processed, to face a mounting table for mounting the substrate thereon. The shower head includes: a facing surface that faces the mounting table to supply a gas to the substrate in a form of shower through a plurality of gas injection holes formed on the facing surface; an opposing surface provided opposite to the facing surface; and a plurality of bar-shaped heat transfer columns standing on the opposing surface. Here, the heat transfer columns have varying lengths and/or thicknesses to adjust heat capacities thereof. The heat transfer columns are made of one of aluminum, stainless steel, and copper.
Claims13
A shower head provided, in a processing chamber in which a substrate is processed, to face a mounting table for mounting the substrate thereon, the shower head comprising:
- a facing surface that faces the mounting table to supply a gas to the substrate in a form of shower through a plurality of gas injection holes formed on the facing surface;
- an opposing surface provided opposite to the facing surface;
- and
- a plurality of bar-shaped heat transfer columns standing on the opposing surface,
- wherein a heat transfer member is provided within a cylindrical member provided at an upper side of the shower head to run across the cylindrical member and the heat transfer member has through holes,
- wherein part of the heat transfer columns is disposed to pass through the through holes and a diameter of each of said part of the heat transfer columns is smaller than that of each of the through holes;
- and
- the showerhead further comprising a plurality of gas exhaust holes provided extending between the facing surface and the opposing surface to exhaust a gas from the facing surface toward the opposing surface,
- wherein the heat transfer columns are provided within an exhaust path.
A plasma processing apparatus, comprising:
- a shower head provided, in a processing chamber in which a substrate is processed, to face a mounting table for mounting the substrate thereon, the shower head comprising:
- a facing surface that faces the mounting table to supply a gas to the substrate in a form of shower through a plurality of gas injection holes formed on the facing surface;
- an opposing surface provided opposite to the facing surface;
- and a plurality of bar-shaped heat transfer columns standing on the opposing surface;
- a cylindrical member provided at an upper side of the shower head;
- and
- a heat transfer member provided within the cylindrical member to run across the cylindrical member, the heat transfer member having through holes,
- wherein part of the heat transfer columns is disposed to pass through the through holes and a diameter of each of said part of the heat transfer columns is smaller than that of each of the through holes,
- wherein the shower head further comprises a plurality of gas exhaust holes provided extending between the facing surface and the opposing surface to exhaust a gas from the facing surface toward the opposing surface, and the heat transfer columns are provided within an exhaust path.
Dependencies are inferred from the claim text.