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US 8,282,381 B1Granted
Nanoimprint resist, nanoimprint mold and nanoimprint lithography
AssigneesTsinghua University, Hon Hai Precision Industry Co., Ltd.
InventorsZhen-Dong Zhu, Qun-Qing Li, Li-Hui Zhang, Mo Chen
Life of this patent
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Abstract
A nanoimprint mold includes a flexible body and a molding layer formed on the flexible body. The molding layer includes a plurality of protrusions and recesses. The molding layer is a polymer material polymerized via a cross linking polymerization of a nanoimprint resist which includes a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), a diluent solvent and a photo initiator.
Claims8
A nanoimprint mold comprising:
- a flexible body;
- and
- a molding layer located on the flexible body, the molding layer comprising a plurality of protrusions and a plurality of recesses;
- the molding layer being a polymer material polymerized via a cross linking polymerization of a nanoimprint resist;
- the nanoimprint resist is a compound comprising a hyperbranched oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), a diluent solvent and a photo initiator.
2 more elements
Dependencies are inferred from the claim text.